After attending the Atom by Atom Fabrication with Electron Beams and Scanning Probes at Oak Ridge National Laboratories (ORNL) in late 2018, John Randall was impressed by the computer simulations of Dr. David Lingerfelt on e-beam interactions with materials. After discussions with Dr. Lingerfelt, Zyvex Labs requested a Rapid Response User Agreement with ORNL to use similar methods to study the distribution of tunneling electrons in our Scanning Tunneling Microscope based Hydrogen Depassivation Lithography process. We are proud to announce that we now have an approved User agreement with ORNL, the home of the World’s most powerful super computer, SUMMIT, to do this computer simulation work. We have had initial discussions with Dr. Lingerfelt and are looking forward to working with him.

Zyvex Lab’s ZyVector™ Control system provides the world’s highest (sub-nm) resolution lithography technology. Click here for more information.

The Zyvex Creep and Hysteresis Correction Controller is a live tip position control for fast settling times after landing, and precise motion across the surface. Click here for more information.