MNE 2005 Micro Nano Graph Contest
Entries Presented by Dr. John Randall – Zyvex Labs
Sponsored by
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Entries Presented by Dr. John Randall – Zyvex Labs |
Sponsored by
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The rules include the following:
In 2005, the first year in which the Micro Nano Graph contest was held at MNE,
41 entries were submitted. There were many outstanding micrographs. The
work represented in the submitted micrographs covered a wide range of fields
including micro mechanical, photonic, and integrated circuit fabrication,
chemical and dry etching, laser optics, carbon nanotube structures, carbon
nanotube growth experiments, biological samples, material science
experiments and, of course, e-beam, ion beam, and nano imprint lithography
experiments.
The panel of judges who selected the award winners were:
• Roxann Engelstad – University of Maryland USA
• Entries have to be of a single image taken with a microscope and not significantly altered.
• There is no restriction with respect to the subject matter.
• Electron and ion micrographs have to be black and white.
• Jos Benschop – ASML the Netherlands
• Hiroshi Arimoto – Selete, Japan
The Awards are:
• First Prize
• Second Prize
• Third Prize
The judges also selected 3 Honorable Mentions.
All 2005 Entries (with original titles)
Judges exercised their prerogative to change the micrograph titles if it pleased them.
Title: Who invited the Irish?
Description:
Si/Cr bilayer has been patterned into a "Siemensstern" with rotational symmetry on Si substrate. After selective etching of the substrate underneath, the rings formed owing to the tensile strain of the Cr layer.
Magnification (3"x4" image): 2.14KX
Instrument: Zeiss SUPRA 55VP
Submitted by: Li Zhang
Affiliation: Paul Scherrer Institute Switzerland
Title: May I exhale now?
Description:
Title: ""
It's a boy!
Description:
Title: Birgit over troubled waters by Birgit
Title: SEMATECH 2010 Logo aka Chastity Belt
Title: No brain, half a spine
Back to Home MNE MicroGraph Contest Home page of the MNE Conference
Polystyrene nanoparticles with a diameter of 500 nm printed on top of a
100µm glass bead using a process similar to micro-contact printing.
Magnification (3"x4" image): Scale on the picture
Instrument: LEO SEM 1550
Submitted by: Laurent Malaquin
Affiliation: IBM Research, Zurich Research Laboratory Switzerland
Third Prize
Part of a Au nanowire which was electro-chemically deposited
on patterned silicon substrate
Magnification (3"x4" image): 270KX
Instrument: JEOL JSM6340F
Submitted by: Ran Ji
Affiliation: Max Planck Institute (MPI) of microstructure physics Halle, Germany
Honorable Mention 
After an accidental lift -off of e-beam defined FOx-lines on SOI-substrate
with subsequent ion-etching and SiO2 - sputter deposition the following
structures were observed:
Magnification (3"x4" image): 55KX
Instrument: JEOL JSM 6700F
Submitted by: Birgit Hadam
Affiliation: Institut für Halbleitertechnik (IHT), RWTH Aachen, Germany
Honorable Mention 
Magnification (3"x4" image): 10 KX
Instrument: Philips XL30 FEG
Submitted by: Tristan Bret
Affiliation: Institute of Applied Optics, Ecole Polytechnique
Fédérale de Lausanne, Switzerland
Honorable Mention 
silicon etched by gas chopping
Magnification (3"x4" image):Scale on the picture
Instrument: Hitachi S-4000
Submitted by: Burkhard E. Volland
Affiliation: University of Kassel, Germany
