MNE 2006 Micro Nano Graph Contest
Entries Presented by Dr. John Randall – Zyvex Labs
Sponsored by
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Entries Presented by Dr. John Randall – Zyvex Labs |
Sponsored by
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The rules include the following:
In 2006, 82 entries were submitted. There were many outstanding micrographs. The
work represented in the submitted micrographs covered a wide range of fields
including micro mechanical, photonic, and integrated circuit fabrication,
chemical and dry etching, laser optics, carbon nanotube structures, carbon
nanotube growth experiments, biological samples, material science
experiments and, of course, e-beam, ion beam, and nano imprint lithography
experiments.
The panel of judges who selected the award winners were:
• Jun-ichi Fujita – University of Tsukuba, Japan
• Entries have to be of a single image taken with a microscope and not significantly altered.
• There is no restriction with respect to the subject matter.
• Electron and ion micrographs have to be black and white.
• Lars Montelius – Lund University, Sweden
• Alex Liddle – NIST, USA
The Awards are:
• First Prize
• Second Prize
• Third Prize
The judges also selected 7 Honorable Mentions.
All 2006 Entries (with original titles)
Judges exercised their prerogative to change the micrograph titles if it pleased them.
Title: Tulipes
Description:
Polymeric pattern, after NanoImprint lithography, with high imprinting and demolding temperature
Magnification (3"x4" image): 9.29 k X
Instrument: SEM LEO 1530
Submitted by: Irene Fernández
Affiliation: CNM, IMB - Barcelona
Title: "Earth caught in a Spiderweb"
Description:
Title: ""
micro-Viagra® test arrays
Description:
Title: Not an Escher
Description:
Title: Salieri’s revenge!
Description: Result of printing a real 3D structure in a
UV-NIL process. Greyscale level represents depth of the structure.
Title: Eye of Sauron
Description:
Title: Who is looking at who?
Description:
Title: Discord fell on Gizeh
Description:
Title: Bumping Uglies
Description:
Title: Fractal Gaudi’
Description:
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A high stress nitride film crazes after laser spot crystallization of a
silicon film below. Almost every vertex has no more or less than three
lines emanating from it.
Magnification (3"x4" image): 300 X
Instrument: In-situ microscope with Mitutoyo 50x objective
Submitted by: Daniel Witte
Affiliation: Stanford University, Stanford, California USA
Third Prize
X-ray lithography of a 10 µm SU-8 film, fields of columns with different diameter and pitch.
Patterns as indicators for the limit of stability.
Magnification (3"x4" image): 1700 X
Instrument: M. MIKRONA SEM 525 M (Philips)
Submitted by: Timo Mappes
Affiliation: Forschungszentrum Karlsruhe GmbH, Germany
Honorable Mention 
Accidental undercutting of square pits, during cryo etch in Si, resulting in a
freestanding cage structure
Magnification (3"x4" image): 800X
Instrument: FEI XL30 SFEG
Submitted by: Chris Rétif
Affiliation: FOM-AMOLF, Amsterdam The Netherlands
Honorable Mention 
Magnification (3"x4" image): 1200 X
Instrument: LEICA INM 100 (optical microscope)
Submitted by: Guido Piaszenski
Affiliation: Raith GmbH, Germany
Honorable Mention 
A magnetically actuated 1 ul water droplet containing super-paramagnetic particles of 250 nm diameter over a Teflon covered multilayer Printed Circuit Board. The droplet is submerged in silicone oil.
Magnification (3"x4" image): 32X
Instrument: Zeiss Stemi V6
Submitted by: Ulrike Lehmann
Affiliation: EPFL, Lausanne, Switzerland
Honorable Mention 
1micron latex beads onto Silicon-100 Surface
Magnification (3"x4" image): 6.37Kx
Instrument: LEO 32
Submitted by: Jordi Teva
Affiliation: Universitat Autonoma de Barcelona
Honorable Mention 
Under-etched pyramid. The white material is Cu with etched Ni underneath
Magnification (3"x4" image): 20 kX
Instrument: NOVA200 NANO SEM
Submitted by: Edouard Duriau
Affiliation: IMEC, kapeldreef 75, B3001 Leuven, Belgium
Honorable Mention 
Defects on gold Fresnel zone plate after electroplating and Ar sputter etching.
Magnification (3"x4" image): 50 KX
Instrument: ZEISS SUPRA 55VP
Submitted by:Konstantins Jefimovs
Affiliation: Laboratory for Micro- and Nanotechnology, Paul Scherrer Institut, Switzerland
Honorable Mention 
Optical image of quantum trees evolving from quantum dot solution by evaporation.
Magnification (3"x4" image): Scale on the picture
Instrument: AxioCam MR
Submitted by: Yongfeng Mei
Affiliation: Max-Planck Institute for Solid State Research, Stuttgart, Germany.
