MNE 2016 Micro Nano Graph Contest
Entries Presented by Dr. John Randall – Zyvex Labs
Sponsored by
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Entries Presented by Dr. John Randall – Zyvex Labs |
Sponsored by |
In 2016, 75 entries were received from 13 Countries and 3 Continents.
RULES
• Entries have to be of a single image taken with a microscope and not significantly altered.
JUDGES
•Michael Stifter -World Champion in Botball robotics - Austria
AWARDS
• First Prize
The judges also selected 10 Honorable Mentions. COMMENTS:
Winners and Honorable Mentions will be displayed in perpetuity at www.ZyvexLabs.com
All 2016 Entries
"Escape of the pod people"
Description: Metallic nano-flowers generated by IBE and RIE of an Al-Ti-Au-Ti coated wafer, patterned with standard photolithography. After etching, the resist is removed, the stress in the fences is released leading to the formation of the wavy stem/leaves of the flower.
"No Fluffy, That is High Voltage"
"I worked my butt off for this nice SEM"
Description: Reflow of positive tone resist
"Tiny Stonehenge"
Description:
The skeleton of copper pillars. After electroplating, silicon substrate is removed leaving the copper-filled through-silicon vias.
"Lightly Plucked"
Description: Buckling of clamped-clamped Nickel beams due to the heating by a red laser.
"Escher reprinted"
Description:
Magnification (3"x 4" image): 700 X
"No please, not another micrograph contest"
Description: Piece of peeled off resist mask - found this little fellow at the edge of deep silicon etch structures. Make sure you got the parachute before jump!
"Trump Casino"
Description: After electron beam lithography and evaporation of gold, the last lift-off processing step went catastrophically wrong with the delamination of most structures bringing chaos into the nanoworld of plasmonic antennas!
"Tiny-Stonehenge"
Description: The skeleton of copper pillars. After electroplating, silicon substrate is removed leaving the copper-filled through-silicon vias.
"Nano-Louvre"
Description: Replica of the glass pyramids in the courtyard of the Louvre (Paris) in a scale of 1: 8.000.000. The basement and the fountains are a FIB-cut, the 3D-structures (branch sizes between 25 and 70 nm) consist of platinum and carbon. This image demonstrates the 3D-Nanoprinting capabilities of Focused Electron Beam Induced Deposition (FEBID). Compare it to the real Louvre!
"Silicon Shard Horse"
Description: Silicon shards from a broken grating fabricated by deep reactive ion etching resemble a horse.
"African ceremonial mask"
Description: Positive Tone Resist structured by UV-lithography. The African ceremonial mask appeared during reflow.
"Do typewriters dream of selectric sheep?"
Description: Image shows a patterned curved surface fabricated with UV based soft nanoimprint lithography. The sphere has a diameter of around 100µm and the pillar pattern has a period of 2,5µm. The soft stamp deforms around the object and patterns the whole surface.
"And that is why we call the kid Blockhead"
Description : It supposes to be nice carbon cantilevers however during the pyrolysis process, the stress turns them to the curly carbon cantilevers.
Back to Home MNE MicroGraph Contest Home page of the MNE Conference
There were many outstanding micrographs. The work represented in the submitted
micrographs covered a wide range of fields including micro mechanical, photonic,
and integrated circuit fabrication, chemical and dry etching,biological samples,
material science experiments and, of course, e-beam, ion beam, and nano imprint lithography experiments.
• There is no restriction with respect to the subject matter.
• Electron and ion micrographs have to be black and white.
•Maan Alkaisi -MacDiarmid Institute Ð New Zealand
•Falco van Delft Ð Nanovalk - The Netherlands
•Alex Liddle Deputy Director CNST, NIST - USA
• Second Prize
• Third Prize
• People's Choice Award
First Prize 
Magnification (3"x 4" image): 7000 X
Instrument Zeiss Merlin
Submitted by: Valentin Flauraud & Benoit Desbiolles
Affiliation: EPFL LMIS1 Switzerland
Second Prize 
This nice structure crystallized after development on the edge of a Fresnel zone plate made from HSQ
Magnification (3"x 4" image): 44000 X
Instrument: SEM Zeiss Supra 55VR
Submitted by: Felix Marschall
Affiliation: Paul Scherrer Institut
Third Prize 
Magnification (3"x 4" image): 600 X
Instrument: Fei InspectS50
Submitted by: Arne Schleunitz & Susanne Gruetzner
Affiliation: micro resist technology GmbH
MNE People's Choice Award - The Judges also selected this micrograph for an honorable meniton award. 
Magnification (3"x 4" image): ??
Instrument: ZEISS Supra 40VP SEM
Submitted by: Hoa le Thanh
Affiliation: Technical University of Denmark
Honorable Mention
Magnification (3"x 4" image): 10X
Instrument: Carl Zeiss SEM
Submitted by: Tom Larsen
Affiliation: ANEMS - EPFL
Honorable Mention 
Instrument: Supra 40VP SEM
Submitted by: Suhith Hemanth
Affiliation: DTU, Nanotech
Honorable Mention 
Magnification (3"x 4" image): 1.6 KX
Instrument: Zeiss Gemini Supra 25
Submitted by: Katarzyna Korwin-Mikke
Affiliation: Oxford Instruments
Honorable Mention 
Magnification (3"x 4" image): 32000 X
Instrument: Zeiss Merlin
Submitted by:Valentin Flauraud
Affiliation: EPFL LMIS1 Switzerland
Honorable Mention 
Magnification (3"x 4" image): ??
Instrument: ZEISS Supra 40VP SEM
Submitted by: : Hoa le Thanh
Affiliation: Technical University of Denmark
Honorable Mention 
Magnification (3"x 4" image): 5KX
Instrument: FEI Fib Nova200
Submitted by:Robert Winkler
Affiliation: ZFE, Graz Centre for Electron Microscopy
Honorable Mention 
Magnification (3"x 4" image): 4.5 kX
Instrument: SEM Zeiss Supra VP55
Submitted by: Joan Vila-Comamala
Affiliation: ETH Zurich
Honorable Mention 
Magnification (3"x 4" image): 5X
Instrument: : Olympus BX51M
Submitted by: Maria-Melanie Russew
Affiliation: micro resist technology GmbH
Honorable Mention 
Magnification (3"x 4" image): ??
Instrument: ZEISS 1540XB CrossBeam
Submitted by: Michael J. Haslinger
Affiliation: Profactor GmbH
Honorable Mention 
Magnification (3"x 4" image): 245 X
Instrument: : Zeiss Supra 40 VP SEM
Submitted by: : Long Nguyen Quang
Affiliation: DTU Nanotech