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MNE 2015 Micro Nano Graph Contest
“A good Micrograph is worth more than the MegaByte it consumes.”Entries Presented by Dr. John Randall – Zyvex Labs
Sponsored by
In 2015, 104 entries received from 21 countries and 5 continents.
There were many outstanding micrographs. The work represented in the submitted
micrographs covered a wide range of fields including micro mechanical, photonic,
and integrated circuit fabrication, chemical and dry etching,biological samples,
material science experiments and, of course, e-beam, ion beam, and nano imprint lithography experiments.
RULES
- Entries have to be of a single image taken with a microscope and not significantly altered.
• There is no restriction with respect to the subject matter.
• Electron and ion micrographs have to be black and white.
JUDGES
- Nedyalka Panova –Art and Science Visual Artist – Univ. of Cork, Ireland
•Vitaliy Guzenko – E-Beam Lithography Master – PSI, Switzerland
•Joshua Ballard – Research Scientist – Zyvex Labs, USA
AWARDS:
The judges also selected 12 Honorable Mentions.
And for the first time the MNE People’s Choice award where all attendees could vote on their favorite micrograph.
• People’s Choice Award
COMMENTS:
Winners and Honorable Mentions will be displayed in perpetuity at www.ZyvexLabs.com
First Prize
“Abstract expressionism in polymer microphases”
Description: Phase separation induced by the degradation of the polymer
Magnification (3″x 4″ image): 10 X
Instrument: OLYMPUS MX51-F
Submitted by: Theodoros Manouras
Affiliation: Institute of Electronic Structure and Laser (IESL), Greece
Second Prize
“nano alphabet soup”
<spantyle=’font-size:10pt;font-family:”trebuchet ms”;color:#000000’=””>Description:
Maskless reactive ion etching of fused silica wi th e-beam deposition 40 nm of Au
Magnification (3″x 4″ image): 135.000x
Instrument: SEM ZZeiss Supra
Submitted by: Anil Thilsted & Kristian Sørensen
Affiliation: DTU Nanotech
Third Prize
“Hairy pyramids”
Description: InAs nanowires grown on KOH-textured Si (100) substrates. The nanowires grow perpendicular on the side facets of the Si pyramids.
Magnification (3″x 4″ image): 10.0 KX
Instrument: Zeiss Gemini 1550
Submitted by: Torsten Rieger
Affiliation: Forschungszentrum Jülich
MNE People’s Choice Award – The Judges also selected this micrograph for an honorable meniton award.
“Atomic Running Track”
Description: Running track with just the right size for atoms, which is made up of carbon onion with 0.369 nm gap between each track (layer).
Magnification (3″x 4″ image): 500 KX
Instrument: JEOL JEM2100
Submitted by: Tso-Fu Mark Chang
Affiliation: Tokyo Institute of Technology
Honorable Mention
“Monster’s Eye”
Description: Dark field image of failed protein crystallization trial on 250 nm thick silicon nitride membrane performed in nanoliter capacity chamber.Deposited protein material clustered around the edges of the membrane and dried out gradually from outside to the center forming reptile like eye effect.
Magnification (3″x 4″ image): 800X
Instrument: INM 20 Leica microscope
Submitted by: Nadia Opara
Affiliation: Paul Scherrer Institute, Switzerland
Honorable Mention
““The Person and the finger””
Description: Magnification (3″x 4″ image): 118.06 kX
Instrument: Zeiss Supra 55 VP
Submitted by: Robert Kirchner
Affiliation: Paul Scherrer Institute, Switzerland
Honorable Mention
“Microsphere in the net border!”
Description: Micro metal grid mesh was fabricated by the self-rolling of metal/SiO2 bifilm stress. Polystyrene microparticles were inserted into the micro grid net during self-rolling of the microtube or micro grid net.
Magnification (3″x 4″ image): 1.0 KX
Instrument: JEOL FESEM (JEOL JSM-7000F)
Submitted by: Kook-Nyung Lee
Affiliation: Korea Electronics Technology Institute
Honorable Mention
“Nanopore fabrication process”
Description: This video shows the strong variation experienced by the pH at the pore formation moment, precisely at the equivalence point, because the proposed method is based on specific neutralization using HCl to neutralize etching process of silicon wafer with KOH.
Magnification (3″x 4″ image):
Instrument: Olympus BX51 microscope
Submitted by:Milena Vega
Affiliation: National Technological University (UTN), 1706 Argentina
Honorable Mention
“Ring of Plasmonics”
Description: Eight plasmonic ring structures were milled with a FIB system into an existing ellipse in a gold layer. The plasmonic signal should be enhanced.
Magnification (3″x 4″ image): 35 KX
Instrument: FEI Helios 650 Dualbeam
Submitted by: Thomas Loeber
Affiliation: NSC, TU Kaiserslautern, Germany
Honorable Mention
“Winter is coming”
Description: Biological cells were cultivated in salt water and this solution was dripped onto a TEM grid for analysis of the cells. The dried NaCl crystals built this snow flake like structures.
Magnification (3″x 4″ image): 508 X
Instrument: FEI HeIios NanoLab 650 Dualbeam
Submitted by:Thomas Loeber
Affiliation: NSC, TU Kaiserslautern (Kaiserslautern,Germany)
Honorable Mention
“Picasso in the Chamber”
Description: This image is an artefact from the inside of the SEM microscope chamber. It can be tentatively attributed to an electron mirror effect as a result of charge buildup on our electrically isolated sample.
Magnification (3″x 4″ image): 125X
Instrument: FEI Helios Nanolab 600
Submitted by:Angelo Accardo
Affiliation: Istituto Italiano di Tecnologia
Honorable Mention
“Awaiting the nano-Titanic”
Description: An islet on Ge surface modified by low energy heavy ions beam.
Magnification (3″x 4″ image): 3.0 KX
Instrument: SEM Jeol JSM7401F
Submitted by:Erica Iacob
Affiliation: Fondazione Bruno Kessler
Honorable Mention
“Tears of God”
Description: Bubbles caused by chemical etching on Si look like tears.
Magnification (3″x 4″ image): 1.0 KX
Instrument: Zeiss optical microscope
Submitted by: Xin Li
Affiliation: Fudan University, China
Honorable Mention
“TITLE”
Description: Gratings on Si after chemical etching looks like a frightened man who is forbidden to speak.
Magnification (3″x 4″ image): 1.0 KX
Instrument: Zeiss optical microscope
Submitted by: Xin Li
Affiliation: Fudan University, China
Honorable Mention
“TITLE” Nano-Xide Xie
Description: The nano-Xide Xie is fabricated by 3D gray scale e-beam lithography with a wide of 13.26 µm and a height of 18 µm.
Magnification (3″x 4″ image): 4.0 KX
Instrument: JEOL 6300
Submitted by: Chen Xu
Affiliation: Fudan University