←2018 |
Zyvex Lab’s ZyVector™ Control system provides the world’s highest (sub-nm) resolution lithography technology. Click here for more information | The Zyvex Creep and Hysteresis Correction Controller. Live tip position control for fast settling times after landing, and precise motion across the surface. Click here for more information. |
The MNE 2019 micrograph contest is now closed. Please see all 2018 award winners and entries below.
The rules include the following:
- Entries have to be of a single image taken with a microscope and should not be significantly altered.
- There is no restriction with respect to the subject matter.
- Electron and ion micrographs have to be black and white.
In 2019, 63 entries were submitted. The entries came from:
Germany, Japan, The Netherlands, Denmark, Greece, Italy, Belgium, Turkey, Mexico, Russia, United Kingdom, Switzerland, India, Saudi Arabia, Korea, United States, France, Austria, Spain, and the Czech Republic.
The judges were:
-
Chris Mack – Litho Guru
-
Ioannis Michaloudis – Artist-Scientist
-
Sami Franssila – The Microfabrication Guy Aalto University
-
Elina Hermanson – MD, Accidental Tourist with a Doctorate from the past.
There were 4 awards:
- 1st Place
- 2nd Place
- 3rd Place
- MNE People’s Choice
There were also 6 honorable mentions given.
1st Place
2nd Place
3rd Place
MNE People’s Choice
Honorable Mentions
Complete list of entries