Zyvex Labs will present three papers, be an exhibitor, and host the Micro-Nano-Graph Contest at the MNE 2018 Conference in Copenhagen Sept. 24-27. The three presentations include the MNE Fellow Plenary talk by John Randall on “Digital Atomic Scale Fabrication”, an oral talk by Udi Fuchs (pictured) entitled, “Identifying surface elements in STM images using Neural Networks”, and a poster presentation by James Owen on “2D dopant arrays using a Tip-assisted Incorporation Process” (please note: these were the abstract titles at the time of submission but may change). 

MNE 2018 will be the 44th conference in a series that was started in Cambridge in 1975. The conference brings together engineers and scientists from all over the world to discuss recent progress and future trends in the fabrication and application of micro- and nanostructures and devices. Applications in electronics, photonics, electromechanics, environment, life sciences and biology are also discussed.

Zyvex Lab’s ZyVector™ Control system provides the world’s highest (sub-nm) resolution lithography technology. Click here for more information.

The Zyvex Creep and Hysteresis Correction Controller is a live tip position control for fast settling times after landing, and precise motion across the surface. Click here for more information.